日本応用磁気学会誌
Online ISSN : 1880-4004
Print ISSN : 0285-0192
ISSN-L : 0285-0192
薄膜
反応液を薄液膜とする方式(薄液膜方式)によるフェライトメッキ
玉浦 裕後藤 吉孝五味 学阿部 正紀
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ジャーナル オープンアクセス

1986 年 10 巻 2 号 p. 303-306

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Polycrystalline Fe3O4- and Co-ferrite films were plated on glass- and PET-substrates by a modified method of the electroless ferrite-plating technique, “thin liquid-film (TLF) method.” Aqueous solutions (reaction solution, oxidizing solution) were flowed through the reaction cell (22 × 7 mm2, space ∼ 10 μm) in which the substrate had been placed. The reaction was influenced by the flow rates of the reaction solution (vr) and oxidizing solution (vo), flow time (tf) of the oxidizing solution, interval of the flow (ti) of the oxidizing solution, reaction temperature (T), concentration of the dissolved oxygen in the oxidizing solution (partial pressure of the oxygen in the air/N2 gas passed through the oxidizing solution, pO2), and reaction pH. Under the condition where vr, vo=15ml/min, tf=1 s, and ti=20 s, effects of T, pO2, and pH on the ferrite plating reaction were studied.
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© 1986 (社)日本応用磁気学会
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