真空
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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第一原理計算に基づく反応性イオンエッチングプロセスの設計
~始めの一歩~
松本 茂野Wilson A. T. DIÑOMelanie Y. DAVIDRifki MUHIDATanglaw A. ROMAN国方 伸一高野 史好秋永 広幸笠井 秀明
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2007 年 50 巻 6 号 p. 437-439

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  We propose an intricate method of Reactive Ion Etching (RIE) process design for transition-metal (TM) materials using ab-initio calculations.
  The TM materials are inert in dry etching processes since volatile etching by-products cannot be formed easily. However, to achieve new high-performance memories based on the TM materials, a selective dry etching technique such as RIE is eagerly required instead of the conventional ion milling method.
  In this work, we would like to introduce our scenario of the RIE design for TM materials using the results of CoFe as an example.
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© 2007 日本真空協会
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