Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Direct Patterning of Metal Conductors and Metal Oxide Dielectrics by Photochemical Metal Organic Deposition: The Direct Patterning of Lanthanides.
J. Pablo Bravo-VasquezL. W. Celia ChingW. L. LawRoss H. Hill
Author information
JOURNAL FREE ACCESS

1998 Volume 11 Issue 4 Pages 589-596

Details
Abstract
Department of Chemistry, Simon Fraser University, Burnaby, British Columbia, Canada, V5A 1S6 The photochemistry of thin films of Ln(O2CCH(C2H5)C4H9) 3 (Ln=La, Dy, Gd, Eu) are investigated as a means to deposit patterned films of the metal oxides of the lanthanides. The films are photosensitive, generating carbon dioxide, heptyl radical and the lanthanide. The lanthanide reacts with oxygen from the air to yield the metal oxide. Two heptyl radicals undergo a hydrogen transfer reaction to yield heptane and heptene. The quantum yields are high and may indicate a chain process. A possible mechanism for the chain process is presented. The use of this method to deposit patterned films is demonstrated by the fabrication of 1.5 μm wide lines by contact mask lithography.
Content from these authors
© The Technical Association of Photopolymers, Japan
Previous article Next article
feedback
Top