Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Below 100-nm Hole Pattern Formation Using Resolution Enhancement Lithography Assisted by Chemical Shrink (RELACSTM)
Toshiyuki Toyoshima, Takeo Ishibashi, Naoki Yasuda, Shinji Tarutani, Takashi Kanda, Kiyohisa Takahashi, Yusuke Takano, Hatsuyuki Tanaka
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Keywords: RELACS, resolution enhancement, hole shrinking, chemically amplified resist
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2002 Volume 15 Issue 3 Pages 377-378

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© The Technical Association of Photopolymers, Japan
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