The Photopolymer Science and Technology Award No. 251100, the Outstanding Achievement Award 2025, has been presented to Dr. Jos Benschop (ASML) in recognition of his remarkable contributions to the field of photopolymer science and technology, particularly for "bringing EUV Lithography from the research phase to high-volume manufacturing.".

The Photopolymer Science and Technology Award No. 252100, the Best Paper Award 2024, was presented to Jordan Greenough, Nitinkumar S. Upadhyay, Shaheen Hasan, Munsaf Ali, Ricardo Burke, Greg Denbeaux and Robert L. Brainard (Department of Nanoscale Science and Engineering at the University at Albany for their outstanding contribution published in Journal of Photopolymer Science and Technology, 37, (2024) 273-278, entitled “Positive-Tone Organoantimony Resists”.

The Photopolymer Science and Technology Award No. 252200, the Best Paper Award 2024, was presented to Tomokazu Umeyama^a, Motohisa Kubota^b, Haoxuan Zhang^b, Rintaro Adachi^c, Akira Yamakata^c, Tomoyuki Koganezawa^d, and Hiroshi Imahori^b (^aUniversity of Hyogo, ^bKyoto University, ^cOkayama University, ^dJapan Synchrotron Radiation Research Institute) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 37, (2024) 197–204, entitled “Development of Non-Fullerene Acceptors with π-Extended Central Unit for Organic Photovoltaic Devices”.