Journal of Photopolymer Science and Technology

Featured article

Volume 38 (2025) Issue 1 Pages 1-2

The Photopolymer Science and Technology Award

Jos Benschop

The Photopolymer Science and Technology Award No. 251100, the Outstanding Achievement Award 2025, has been presented to Dr. Jos Benschop (ASML) in recognition of his remarkable contributions to the field of photopolymer science and technology, particularly for "bringing EUV Lithography from the research phase to high-volume manufacturing.".

Volume 38 (2025) Issue 1 Pages 3-6

The Photopolymer Science and Technology Award

Jordan Greenough, Nitinkumar S. Upadhyay, Shaheen Hasan, Munsaf Ali, Ricardo Burke, Greg Denbeaux, Robert Brainard

The Photopolymer Science and Technology Award No. 252100, the Best Paper Award 2024, was presented to Jordan Greenough, Nitinkumar S. Upadhyay, Shaheen Hasan, Munsaf Ali, Ricardo Burke, Greg Denbeaux and Robert L. Brainard (Department of Nanoscale Science and Engineering at the University at Albany for their outstanding contribution published in Journal of Photopolymer Science and Technology, 37, (2024) 273-278, entitled “Positive-Tone Organoantimony Resists”.

Volume 38 (2025) Issue 1 Pages 7-9

The Photopolymer Science and Technology Award

Tomokazu Umeyama, Motohisa Kubota, Haoxuan Zhang, Rintaro Adachi, Akira Yamakata, Tomoyuki Koganezawa, Hiroshi Imahori

The Photopolymer Science and Technology Award No. 252200, the Best Paper Award 2024, was presented to Tomokazu Umeyama^a, Motohisa Kubota^b, Haoxuan Zhang^b, Rintaro Adachi^c, Akira Yamakata^c, Tomoyuki Koganezawa^d, and Hiroshi Imahori^b (^aUniversity of Hyogo, ^bKyoto University, ^cOkayama University, ^dJapan Synchrotron Radiation Research Institute) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 37, (2024) 197–204, entitled “Development of Non-Fullerene Acceptors with π-Extended Central Unit for Organic Photovoltaic Devices”.

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2025 Volume 38 Issue 4

Improvement of Sensitivity and Resolution by Carboxylic Acid Type Dissolution Inhibitor in Three-Component Chemically Amplified Photosensitive Polyimide Daiki Madokoro, Katsuaki Takashima, Kohei Yamaoka, Susumu Tanaka, Tomoyuki Yuba, Hideo Horibe
PFAS-free Rinse Materials for Pattern Collapse Mitigation in EUV Lithography Raymond Jin, Kazuma Yamamoto, Naoki Matsumoto, Maki Ishii, Miho Yamaguchi, Yusuke Hama, Takuo Endo
Benzothiadiazole-Based Fused-Ring Electron Acceptors for Green-Light Wavelength-Selective Organic Solar Cells Seihou Jinnai, Yuto Shiono, Kai Wang, Yohei Iimuro, Yasuyuki Watanabe, Shin-ichiro Kato, Yutaka Ie
Modeling of Elastoplastic Deformation of Polymeric Microneedles using Finite Element Method Yukihiro Kanda, Hiroaki Takehara, Takanori Ichiki

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