2005 Volume 3 Pages 113-119
The methods of Differential Reflection Spectroscopy (DRS) and Atomic Force Microscopy (AFM) have been applied to study early stages of β-FeSi2 silicide formation. Some details on the Dynamic Standard method in DRS are presented. The imaginary part of the dielectric function of the β-FeSi2 film during its formation are calculated. [DOI: 10.1380/ejssnt.2005.113]