Abstract
We have studied the relation between scratch resistance and organic substituent(R) of alkoxy silane hydrolysate (RSi(OH)3), and the following results were obtained.(1) In order to improve the scratch resistance of film, it's necessary that the steric hindrance of substituent is decreased in the cource of condensation reaction.(2) Methyl group is the best substituent.(3) It is unable to obtain high scratch resistance in the substituent of more than 2 carbon atoms, because of less of cross-linkage structure.(4) The coating materials which consist of methyl group silane and vinyl group silane not only give the excellent scratch resistance, but also improve the adhesion for all of PMMA substrate.
