Analytical Sciences
Online ISSN : 1348-2246
Print ISSN : 0910-6340
ISSN-L : 0910-6340
Original Papers
Contribution of Ni KLL Auger Electrons to the Probing Depth of the Conversion Electron Yield Measurements
Shinjiro HAYAKAWAAya TANAKATakeshi HIROKAWA
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2010 Volume 26 Issue 2 Pages 233-237

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Abstract

The averaged attenuation length of emitted electrons with the conversion electron yield (CEY) method was evaluated for Ni films with the x-rays below and above the Ni K absorption edge. The evaluated attenuation length was 13.1 nm with the x-rays below the Ni K absorption edge, and it became 24.0 nm with the contribution of Ni KLL Auger electrons that had the attenuation length of 78.1 nm. The probing depth of the CEY measurements are determined both the penetration depth of x-rays and the attenuation length of emitted electrons, and the modification of the probing depth was investigated with the grazing incidence condition. The glancing angle dependence of the CEY was compared with the model calculation, and the probing depth of around 1.6 nm was realized under the total reflection condition. The probing depth was controlled from 1.6 nm to the attenuation length by changing the glancing angle.

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© 2010 by The Japan Society for Analytical Chemistry
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