Analytical Sciences
Online ISSN : 1348-2246
Print ISSN : 0910-6340
ISSN-L : 0910-6340
Study of Depth Distribution Shift of Copper on Silicon Wafer Surface Using Total Reflection X-Ray Fluorescence Spectrometry
Yoshihiro MORI, Kengo SHIMANOE
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Keywords: Total reflection X-ray fluorescence spectrometry, silicon wafer, contamination, copper, depth distribution, angle scan
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1996 Volume 12 Issue 2 Pages 277-279

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