アジア・太平洋化学工学会議発表論文要旨集
Asian Pacific Confederation of Chemical Engineers congress program and abstracts
セッションID: 1P-12-006
会議情報

Thin Palladium Film Deposition by a CVD Technique
Tomomitsu AkihaTakemi NambaNaotsugu Itoh
著者情報
キーワード: Palladium, Membrane, CVD, Hydrogen
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抄録
A technique and equipment developed in this study is based on a chemical vapor deposition (CVD) under a forced flow, where since some pressure difference between the outside and the inside of the support tube is applied, the chemical vapor can enter the porous layer of the support and then decompose. Palladium acetate was used as palladium source. The tubular support made from α-alumina powder is porous and has an average pore diameter of 0.15µm. The CVD was carried out by heating according to a programed temperature under a regulated pressure. The palladium membrane thus obtained was as thin as 2- 4 m, and had a good H2/N2 selectivity exceeding 5000.
著者関連情報
© 2004 The Society of Chemical Engineers, Japan
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