Abstract
TiO2 photocatalyst films were prepared by the low-pressure metalorganic chemical vapor deposition (LPMOCVD) at different reaction temperatures and different deposition times using TTIP (Titanium Tetra Iso-Propoxyde). First, characteristics of CVD preparation of TiO2 films were experimentally studied as a function of CVD reaction temperature and deposition time. Secondly, photocatalitic activities of TiO2 films were evaluated by decomposition rate of methylene blue in aqueous solution using photo-reactor. The results indicated that film thickness was linearly proportional to the deposition time. Structure of the film was strongly dependent on the reaction temperature and deposition time. Among the grown TiO2 films, anatase and rutile showed high photocatalytic activity. However, amorphous TiO2 films showed lower activities. The photocatalytic activity strongly depends on the film deposition time (or film thick-ness) in nonlinear way. The optimum thickness of TiO2 catalyst film grown by LPMOCVD may locates between 3µm and 5µm.
