Far UV Photolysis of Uracil and Cytosine in Phosphate Solution

Hongxin Li; Wenqing Wang; Feng Lin; Jilan Wu

doi:10.2187/bss.12.160

Hongxin Li, Wenqing Wang, Feng Lin, Jilan Wu

著者情報

キーワード: UV photolysis, uracil, cytosine, phosphate

ジャーナルフリー

1998 年 12 巻 3 号 p. 160-164

DOI https://doi.org/10.2187/bss.12.160

詳細

抄録

The photolysis of nucleobases, nucleosides and nucleotides (NA) was enhanced by phosphate under irradiation of medium pressure mercury lamp (MPML). Uracil and Cytosine in phosphate solution were selected to study the mechanism of phosphate effect. Photoproducts were produced in the irradiated uracil and cytosine of phosphate solution which have been isolated by anion exchange resin. Ultraviolet irradiation (190-220nm) of uracil in 0.05 mol/dm³ phosphate buffered solution at pH 8-9 leads to the production of a novel compound C₄H₅N₂O₆P which has been identified by UV, ¹H-NMR spectroscopy and LC/MS/MS. The formation mechanism of the photoproduct and the kinetics were studied.

責任著者(Corresponding author)

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