Development and evaluation of an experimental design algorithm for chemical vapor deposition

Abstract

In order to automate the research and development process for chemical vapor deposition (CVD) processes, we developed and proposed a concept of planning experimental design automatically. The concept was applied to identifying the reaction mechanism (reaction model) that indicates the reaction paths both in a gas-phase and on a surface from the reactant (source gas) to the product (film). In addition, we evaluated the validity of the concept which we proposed using the demonstrations by a synthetic CVD process.