Proceedings of JIEP Annual Meeting
The 17th JIEP Annual Meeting
Session ID : 12A-06
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For mass-production of acid copper plating bath for via-filling -Present subjects and countermeasures-
*KAZUYOSHI KAKEHASHITakashi MatsunamiShigeru YamatoNaoto Yoshida
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Abstract

We developed additive which has good deposition effects to through-hole (deposition effects at corner part) and good filling effects at via-hole.To gain stable filling effects continuously, important factors are control of additive concentration, shape of via-hole, covering power of electroless copper plating at the bottom of via-hole and solution circulation.In this test, we studied reason for decrease in filling effects at mass-production bath and its countermeasure.

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© 2003 by The Japan Institute of Electronics Packaging
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