Alkaline Developable, Negative- type Photosensitive Poly(benzoxazole) Based on Poly(o-hydroxy amide), Michael Addition-type Cross-linker and Photobase Generator

Abstract

Nowadays, photosensitive poly(benzoxazole)s (PSPBOs) are widely used as insulating materials. Year by year, the bonding wires and circuits in the micro-chips have become narrower. Therefore, it is concerned that the acids generated from photoacid generators in the PSPBO corrode the narrower copper wires and circuits via micro-chip fabrication. In this presentation, we report a novel, alkaline developable, negative-type PSPBO based on poly(o-hydroxyl amide), a micheal addition type crosslinker, photobase generator without no copper corrosion in the micro-chips.