Proceedings of JIEP Annual Meeting
The 25th JIEP Annual Meeting
Session ID : 8DP-03
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Host: Japan Institute of Electronics Packaging

The 25th JIEP Annual Meeting
Development of photosensitive sulfonated polyimides based on negative-tone reaction development patterning developable with aqueous alkaline solution
*Aya Kasahara, Akio Takahashi, Toshiyuki Oyama
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Keywords: Negative-tone reaction development patterning, Photosensitive polyimide, Sulfonated polyimide, Photoresist, Tetramethylammonium hydroxide
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[in Japanese]
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© 2011 The Japan Institute of Electronics Packaging
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