A Negative-Type Photosensitive Poly(3-hexylthiophene) with Cross-Linker and Photoacid Generator

Abstract

Generally, a micro-patterned phlythiophenes is fabricated by a microcontact printing method. However, this method requires complicated operation resulting in low productivity. To overcome this problem, direct patterning on polythiophenes based on photolithographic method is highly required. In this work, the new negative-type photosensitive polythiophenes consisting of poly(3-hexylthiophene), a cross-linker and a photoacid generator have been developed.