Abstract
The influence of ZnO-MgO mixed metal-organic decomposition (MOD) coating materials have been investigated based on crystal growth and film properties of ZnO-MgO mixed thin films. These mixed thin films were grown on quartz substrates by dip coating and then sintered at 550°C. The film properties were evaluated using an atomic force microscope and a UV-VIS-NIR spectrophotometer, and by performing X-ray diffraction measurements. The growth mechanism is changed by MgO in ZnO-MgO mixed MOD coating materials. Mg segregated to the surface side in the ZnO-MgO mixed thin film, and some of the segregated Mg formed ZnMgO. In addition, the grain size of ZnO-MgO mixed thin films increased with an increase in the amount of MgO additive. Therefore, it can be concluded that grain boundary segregation of Mg enhances crystal growth. This enhancement of crystal growth by the intentional addition of an impurity can be applied to improving the characteristics of other semiconductor materials. [DOI: 10.1380/ejssnt.2015.185]
