2015 Volume 13 Pages 265-268
Graphene has attracted much attention due to its many unique properties and potential applications. It is considered that a chemical vapor deposition (CVD) method is a promising for growth method of graphene. We have examined growth characteristics of graphene by means of a low-pressure alcohol catalytic CVD (LP-ACCVD) method. Here nozzle gas injection is used to supply carbon source gas to a substrate. This method enables efficient supply of carbon source gas to a substrate for the growth of graphene. Therefore, an efficient growth and lowering of the growth temperature of graphene is expected. [DOI: 10.1380/ejssnt.2015.265]