Fe interaction with native SiO2 on Si(001) studied by RHEED

V. V. Korobtsov; V. V. Balashev; T. A. Pisarenko; E. A. Chusovitin; E. V. Markidonov

doi:10.1380/ejssnt.2007.45

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Fe interaction with native SiO₂ on Si(001) studied by RHEED

V. V. Korobtsov, V. V. Balashev, T. A. Pisarenko, E. A. Chusovitin, E. V. Markidonov

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Keywords: Reflection high-energy electron diffraction (RHEED), Atomic force microscopy, Nucleation, Surface diffusion, Surface structure, morphology, roughness, and topography, Iron, Silicides, Surface chemical reaction

JOURNAL FREE ACCESS

2007 Volume 5 Pages 45-50

DOI https://doi.org/10.1380/ejssnt.2007.45

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Abstract

Kinetics of structure and phase constitution of Fe/SiO₂/Si(001) system under different conditions of deposition and annealing was considered. It was established that SiO₂ layer is not destroyed during Fe deposition process over the temperature range from 20 to 650°C. As a result, the Fe films having different morphologies are formed on the oxide surface. Destruction of SiO₂ layer occurs upon annealing on defect places of SiO₂ film that results in the interaction of Fe atoms with the Si substrate and successive silicides formation. [DOI: 10.1380/ejssnt.2007.45]

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