Patterned Deposition of PS Gel is Controlled by Chitosan or Acetic Acid Additives

Abstract

Phase-separation of polymers in thin films produces a wide variety of patterns. Here we show that a polystyrene/poly(methylmethacrylate solution can form stable phase separated structures when an additive such as chitosan or acetic acid is used. The phase separated films were analyzed by fluorescence microscopy. Possible applications of these films are as etching masks for solar cells or for security systems. [DOI: 10.1380/ejssnt.2011.404]