Water in Vacuum Systems: Problems and Solutions

Abstract

For many processes in vacuum, the presence of water is both undesirable and unavoidable. This review offers a qualitative look at a broad spectrum of water related issues and their solutions in vacuum technology. First, a systematic overview outlines the most important technical innovations and publications from the last decades. Relevant properties of surfaces, materials and other contributors of water molecules are also discussed. Second, the review offers practical advice for a multitude of applications ranging from compact lab ultrahigh vacuum devices, production machines like coaters and etchers, to large-scale facilities for space simulation and extreme ultraviolet lithography. The goal of this article is to provide a comprehensive tutorial on effective water handling for users, designers and process engineers in basic research and industry.