Photoalignment Layer Possessing Azo-group in Polymide Main Chain (III) : Anchoring Strength Measurements

Doo-Han Chung; Byoungchoo Park; Hideo Takezoe; Hiroshi Yokoyama; Youngyi Jung; Ha-keun Hwang; Sooman Lee; Sei-Hum Jang; Ki-Jong Han

doi:10.11538/ekitou.1999.0_262

1999年日本液晶学会討論会

DOI https://doi.org/10.11538/ekitou.1999.0_262

会議情報

主催: 日本液晶学会

会議名: 1999年日本液晶学会討論会

開催地: 富山大学五福キャンパス

開催日: 1999/09/29 - 1999/10/01

PCb03 Photoalignment Layer Possessing Azo-group in Polymide Main Chain (III) : Anchoring Strength Measurements

Doo-Han Chung, Byoungchoo Park, Hideo Takezoe, Hiroshi Yokoyama, Youngyi Jung, Ha-keun Hwang, Sooman Lee, Sei-Hum Jang, Ki-Jong Han

著者情報

Doo-Han Chung
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Byoungchoo Park
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Hideo Takezoe
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Hiroshi Yokoyama
Electrotechnical Laboratory
Youngyi Jung
Electronic Materials Research Lab., Institute for Advanced Engineering
Ha-keun Hwang
Electronic Materials Research Lab., Institute for Advanced Engineering
Sooman Lee
Electronic Materials Research Lab., Institute for Advanced Engineering
Sei-Hum Jang
Electronic Materials Research Lab., Institute for Advanced Engineering
Ki-Jong Han
Electronic Materials Research Lab., Institute for Advanced Engineering

会議録・要旨集フリー

p. 262-263

詳細

抄録

The out-of-plane (polar) anchoring strength at the interface between pentylcyanobiphenyl (5CB) and alignment layer possessing azo-group in polyimide main chain (P3) was measured using the High Electric Field (HEF) method^<[1-2]>. The anchoring energy was the order of 10^<-4>J/m^2, and that of rubbed P3 was about two times larger than that of pholoaligned P3. A characteristic temperature dependence in the anchoring energy was found to exist near the clearing temperature of 5CB particularly for the photoalignment layer.

責任著者(Corresponding author)

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