主催: 日本液晶学会
会議名: 2000年 日本液晶学会討論会
開催地: くにびきメッセ
開催日: 2000/10/25 - 2000/10/27
p. 37-38
We have studied the dependence of the pretilt angle on the preparing conditions of a vertical alignment film and on NLC materials in a photo alignment, method. From this study, we showed that the high temperature baking of the alignment film and using a NLC material with large An are needed to create a low pretilt angle. And we succeeded in controlling the pretilt angle as low as 70 degrees without any alignment defects.