日本液晶学会討論会講演予稿集
Online ISSN : 2432-5988
Print ISSN : 1880-3490
ISSN-L : 1880-3490
2002年 日本液晶学会討論会
セッションID: 1A21
会議情報

1A21 ラビングプロセスにおける汚染問題とその対策(ディスプレイ)
*田平 速井上 隆史矢作 保夫今山 寛隆森本 政輝
著者情報
会議録・要旨集 フリー

詳細
抄録
Rubbing is still an only practical method to attain reliable liquid crystal alignment in LCD manufacturing though some other optional ideas have been proposed so far. To realize higher alignment performance for future finer displays we need to look at not only the purpose of the process itself that is molecular ordering in the alignment layer but undesirable side effect like contamination, particle generation and triboelectric charging . The paper presents what kind of surface contamination occurs during rubbing process from fine chemical point of view and tribological factors affecting the issue, which help us to keep using this traditional and well-understood process much more effectively.
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© 2002 日本液晶学会
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