日本液晶学会討論会講演予稿集
Online ISSN : 2432-5988
Print ISSN : 1880-3490
ISSN-L : 1880-3490
2012年 日本液晶学会討論会
セッションID: PB34
会議情報

PB34 光架橋性高分子液晶の高度光配向制御を応用した偏光紫外一度露光によるTN分布構造形成(フォトニクス・光デバイス,ポスター発表,2012年日本液晶学会討論会)
*葛綿 充佐々木 友之野田 浩平小野 浩司川月 喜弘
著者情報
会議録・要旨集 フリー

詳細
抄録
We present a simple yet efficient method to automatically fabricate the twisted nematic structure by one-step exposure on an empty glass cell coated with photocrosslinkable polymer liquid crystal (PCLC) films. The resultant photoalignment directions of two substrates can be orthogonal to each other by controlling the difference between the exposure energy for upper and lower PCLC films and the twisted nematic (TN) structure can be automatically fabricated. The vector grating liquid crystalline cell with TN structure was also fabricated by means of a developed method, and the diffraction properties were well explained by the theoretical calculation on the basis of Jones calculus.
著者関連情報
© 2012 日本液晶学会
前の記事 次の記事
feedback
Top