2019年日本液晶学会討論会
セッションID: 1C05
会議情報
主催: 一般社団法人日本液晶学会
会議名: 2019年 日本液晶学会討論会
開催地: 筑波大学
開催日: 2019/09/04 - 2019/09/06
高温におけるSTN構造の作製と、その特性
詳細
主催: 一般社団法人日本液晶学会
会議名: 2019年 日本液晶学会討論会
開催地: 筑波大学
開催日: 2019/09/04 - 2019/09/06
The liquid crystal (LC) containing photocurable monomers and left handed chiral agent in the TN cell twisted clockwise in 90 degrees formed the Splay Twisted structure twisted counterclockwise in 90 degrees. The Reverse Twisted Nematic (RTN) mode twisted clockwise was formed, when 10 V was applied to the Splay Twisted structure. The obtained RTN structure could be stabilized by UV irradiation. In this study, we tried to stabilize the RTN structure by using thermal energy with low voltage application. By 1.5 V application to Splay Twisted structure at 80℃, and UV stabilization the formation counterclockwise Super Twisted Nematic structure was confirmed.
