表面レリーフ構造を用いた液晶パターンの制御

抄録

When a voltage is applied to a nematic liquid crystal containing ions, a grid-like pattern is observed under crossed polarizers. The appearance of the pattern is affected by the thickness of the insulating films coted on the electrodes. In this study we examine the surface relief structure of the insulating films which are modified with ultraviolet ozone treatment. We found that UVO exposure significantly changes the thickness of the film depending on time. We finally evaluate the effect of relief structure on the pattern formation of nematic liquid crystals.