周期的微細形状による液晶分子の配向状態

抄録

In the cell without rubbing, singular points of schlieren textures grow at the boundary of the pattern. Under applied voltage, reverse tilt disclination grow from the singular points. In the cell with rubbing on the finely patterned substrate, mono domain alignment is obtained. Generation of the reverse tilt disclination is the same as that of the cell without rubbing and is depends on the pattern shape and rubbing direction.