Electrochemistry
Online ISSN : 2186-2451
Print ISSN : 1344-3542
ISSN-L : 1344-3542
Communications
Work Function Measurements of Chemical-etched Silicon Surfaces with Pb-Sn Solder
Osamu IKAWAHumiaki KIRIHATAMasami SHIBATA
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JOURNALS OPEN ACCESS

2003 Volume 71 Issue 1 Pages 5-6

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Abstract

Lead impurities on Si surface after the chemical etching and cleaning process were evaluated by measuring the work function in the silicon chip of the mesa structure. The ultraviolet rays photoelectron analysis in the air and the Maxwell stress microscope analysis were used for the evaluation. The values of the work function on Si surface are influenced by the cleaning technique. The part of low work function corresponds to Pb impurities observed by SEM.

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© 2003 The Electrochemical Society of Japan
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