2003 Volume 71 Issue 10 Pages 860-865
Decomposition behavior of chlorinated aromatics, such as monochlorobenzene, o-dichlorobenzene, and o- chlorophenol by microwave-induced (MI) Ar plasma generated from SiC ceramics has been investigated under atmospheric pressure, and was compared with that of benzene under the same decomposition conditions. Benzene was decomposed and oxidized almost completely by the MI Ar plasma in the Ar-based feed gas containing 3.0% O2 and 0.46% H2O with a maximum CO concentration of 22 ppm. Much larger quantities of CO tended to be produced by the decomposition of other chlorinated aromatics under the almost the same feed gas composition. However, co-addition of H2O in the feed gas was useful for reducing the CO concentration for the decomposition of all the chlorinated aromatics. Therefore, H2O was considered to act as a weak oxidant under the MI Ar plasma decomposition. In addition, it was revealed that an increase in the O2 content to a level of 10% resulted in a decrease of CO concentration in the effluent gas and then promoted complete oxidation of all the chlorinated aromatics, whereas the minimum microwave power to generated MI Ar plasma tended to increase with the O2 content.