Abstract
Electrodeposition of aluminum from the AlCl3-EMIC ionic liquid containing saturated NdCl3 has been carried out by direct and pulse current plating. The effects of some parameters such as current density, pulse frequency, and on/off time ratio (ton/toff) on deposit morphology and crystal size have been investigated. The results showed that the microdeposits changed from polygon crystals to smaller-size spherical crystals as the direct current density increased. The deposits prepared by the pulse current plating gave brighter and flatter surface compared with those by the direct current plating at the same average current density. The deposits displayed dense and smooth surface with about 0.5 µm crystal size under the conditions of ton/toff=8:2, f=100 Hz, im=15 mA/cm2 at 25°C.
