Electrodeposition of Copper Metal from the 1-Ethyl-3-methylimidazolium Fluoride ([EMIM]F)-urea-H2O System Containing Cu2O

Wencai HE; Zhongning SHI; Fengguo LIU; Shan YANG

doi:10.5796/electrochemistry.20-00031

Abstract

In this work, [EMIM]F-urea-H₂O system is capable of dissolving Cu₂O, and then the metallic copper was electrodeposited from this system at room temperature. The reduction of Cu (I) in this system involves a quasi-reversible and one-step single-electron transfer process. The electrodeposition of copper was performed on a tungsten (W) substrate at −0.67 V (vs. Ag) and 353 K via potentiostatic electrolysis. The electrodeposits were identified as metallic copper, as verified by XRD and EDS. SEM image shows that uniform, polygonal nanoparticles of copper were obtained after the potentiostatic static electrolysis.

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This is an open access article distributed under the terms of the Creative Commons Attribution 4.0 License (CC BY, http://creativecommons.org/licenses/by/4.0/), which permits unrestricted reuse of the work in any medium provided the original work is properly cited. [DOI: 10.5796/electrochemistry.20-00031].
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