Electrochemical Formation of Si Films by Co-deposition of Si and Zn in Molten KF–KCl–K2SiF6–ZnCl2 Systems

Wataru MOTEKI; Yutaro NORIKAWA; Toshiyuki NOHIRA

doi:10.5796/electrochemistry.24-00104

Electrochemistry

Online ISSN : 2186-2451
Print ISSN : 1344-3542
ISSN-L : 1344-3542

This article has now been updated. Please use the final version.

ACCEPTED MANUSCRIPT

Electrochemical Formation of Si Films by Co-deposition of Si and Zn in Molten KF–KCl–K₂SiF₆–ZnCl₂ Systems

Wataru MOTEKI, Yutaro NORIKAWA, Toshiyuki NOHIRA

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Keywords: Silicon, Liquid Metal, Molten Salt, Co-deposition

JOURNAL OPEN ACCESS Advance online publication
Supplementary material

Article ID: 24-00104

DOI https://doi.org/10.5796/electrochemistry.24-00104

A newer version of this article is available.

The final version of this article is now available: Vol. 93 (2025), No. 2 pp. 027003-027003

UNCORRECTED PROOF： December 25, 2024
ACCEPTED MANUSCRIPT： December 13, 2024

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This is an open access article distributed under the terms of the Creative Commons Attribution-NonCommercial-ShareAlike 4.0 License (CC BY-NC-SA, https://creativecommons.org/licenses/by-nc-sa/4.0/), which permits non-commercial reuse, distribution, and reproduction in any medium by share-alike, provided the original work is properly cited. For permission for commercial reuse, please email to the corresponding author. [DOI: 10.5796/electrochemistry.24-00104].
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