Sen'i Gakkaishi
Online ISSN : 1884-2259
Print ISSN : 0037-9875
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Mechanism of Stain Blockers for Nylon Substrate
Kazuyuki SatohMasamichi MoritaFumihiko Yamaguchi
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2001 Volume 57 Issue 1 Pages 7-12

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Abstract
The stain-resistance of nylon 6 substrate treated with aqueous polymethacrylic acid solutions (PMAA soln.) was investigated. The stain-resistance increased only when nylon 6 film was treated with acidic PMAA soln. at high temperature (naturally at more than Tg of nylon 6). A dynamic contact angle of water measurement revealed that hydrophilic groups including amino end groups of nylon 6 tend to diffuse on the outer surface of nylon 6 by hot water (temperature>Tg). In addition the stain-resistance was found to have linear correlation with deposited PMAA on nylon 6. All these data denoted that an interaction between PMAA and cationized amino end groups might give a good stain-resistance to nylon 6. We confirmed that the treatment by PMAA soln. with pH 2 produced the nylon 6 having cleaning-durable high stain-resistance. From these data a tentative and possible stain-resistant mechanism was proposed.
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© 2001 The Society of Fiber Science and Technology, Japan
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