Pulsed X-Ray Generation Using a New Type of Plasma Source

抄録

  This paper describes generation of pulsed x-rays with using a formed-ferrite plasma source. The plasma production process of this source is based on an electron／ion emissive filament due to electric current flows which can ensure stable initiation of high vacuum plasmas. Typical performances and advantages of an x-ray diode incorporating this plasma source as a cathode are outlined, together with the overview of conventional plasma cathodes which have been already reported so far. It is also shown that this plasma source itself can be a soft x-ray emitter when it is used alone without an anode structure.