Response of PADC track detectors assessed by the multi-step etching

Abstract

  We have examined the behavior of etch pits growth by using the method of multi-steps etching for samples irradiated by α-particles. Based on the etch pit geometry, we have attained the etch rate ratio as a function of residual range, distance from the end of track, from the growth curves which is assessed from etch pit growth curves against the thickness of layer removed. The response curves have significant dependence of the incident energy, which could be caused by “Missing track effect”.