IEEJ Transactions on Electronics, Information and Systems
Online ISSN : 1348-8155
Print ISSN : 0385-4221
ISSN-L : 0385-4221
Special Issue Review
Compound Semiconductor Materials for Microwave Devises
Yohei OtokiHiroyuki Kamogawa
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JOURNAL FREE ACCESS

2004 Volume 124 Issue 2 Pages 270-276

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Abstract

Mass production technology and new developments in Compound Semiconductor material for Microwave devices are here described. Semi-insulating GaAs was used for Microwave devices from the 1980s. Progress of Epi-taxial technology has enabled higher performance of these devices. Epi-wafers for HEMTs and HBTs are grown by MOVPE and MBE in mass production. Controllability of the growth and improvement of through-put have been carried out in both methods. Quality improvement of conventional technology is still important on a real stage for the next generation devices. The new materials, such as Metamorphic Wafers, InP related material and GaN-HEMT have been developed and are showing high performance. Compound Semiconductors will contribute significantly to the future of Microwave devices.

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© 2004 by the Institute of Electrical Engineers of Japan
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