The transactions of the Institute of Electrical Engineers of Japan.A
Online ISSN : 1347-5533
Print ISSN : 0385-4205
Polycrystalline SiC Thin Films Produced by Plasma CVD
Yoshiharu Onuma, Kiichi Kamimura, Humio Nagaune, Hiroyuki Seki, Kyoichi Tezuka
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1989 Volume 109 Issue 5 Pages 219-226

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