NIHON GAZO GAKKAISHI (Journal of the Imaging Society of Japan)
Online ISSN : 1880-4675
Print ISSN : 1344-4425
ISSN-L : 1344-4425
Regular Paper
Improvement of Field-effect Mobility in Top-gate Organic Field-effect Transistors Using Solution-processed Molybdenum Trioxide Hole Injection Layers
Tomoya AIBATakashi NAGASETakashi KOBAYASHIYuichi SADAMITSUHiroyoshi NAITO
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2018 Volume 57 Issue 5 Pages 537-542

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Abstract

Here, we report on the enhancement of field-effect mobility in solution-processed top-gate organic field-effect transistors (OFETs) based on 2,7-dioctyl[1]benzothieno[3,2-b][1]benzothiophene (C8-BTBT) using solution-processed molybdenum trioxide (MoO3) layers. An aqueous solution of MoO3 was deposited by the spin-coating technique on Au source-drain electrodes fabricated on the Si/SiO2 substrates to form an hole injection layer for the C8-BTBT semiconductor layer. It is found that by exposing MoO3-coated Au electrodes to ultraviolet/ozone (UV/O3) the field-effect mobility of top-gate C8-BTBT FETs significantly increases and the channel-width normalized contact resistance is remarkably reduced to 0.4kΩcm. Top-gate C8-BTBT FET devices with a channel length of 5μm exhibit high effective mobilities up to 1.4cm2V-1s-1. The obtained results indicate that hole doping to C8-BTBT layers by UV/O3-treated MoO3 contributes strongly to the reduction in the access resistance of top-gate C8-BTBT FETs.

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© 2018 by The Imaging Society of Japan
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