DENSHI SHASHIN GAKKAISHI (Electrophotography)
Online ISSN : 1880-5108
Print ISSN : 0387-916X
ISSN-L : 0387-916X
Original Articles
Development of High Resistance Developer for Direct Thermal Paper
Nobuhide TOMINAGA
Author information
JOURNAL FREE ACCESS

1995 Volume 34 Issue 2 Pages 68-75

Details
Abstract

We have studied the new environmental resisting developer which acts as electron acceptor in the color forming reaction with leuco dye as electron donor by use of electronic molecular orbital calculation. We have newly found 2,4-Dihydoxy-2'-methoxybenzanilide (SV-3) as the excellent developer which improves the enviromental resistance of thermal image density. The SV-3 was also conirmed to be non-mutagenic in Ames-test.
The molecular orbital calculations show that the SV-3 is easy to form a stable charge transfer complex with leuco dye and also suggest that color forming stability and enviromental resistance in the thermal paper greatly depend on the degree of overlapping orbitals between the leuco dye and the developer.

Content from these authors
© 1995 by The Imaging Society of Japan
Next article
feedback
Top