Abstract
We have developed a 15-in. TFT array fabrication process that assures a high production yield for workstation applications.
In order to minimize signal delay in our LCDs, we used aluminum for the gate and the source bus-lines.For the gate lines, an aluminum-silicon alloy with a chromium-overcoat was employed to suppress hillock formation. As for the source lines, a titanium barrier was used to prevent aluminum diffusion into the semiconductor layer.
In order to reduce the possibilities of open and cross-over short defects, we have developed gate aluminum-silicon alloy and contact hole tapering processes. Furthermore silicon-nitride and tantalum-oxide double insulators were employed.
By utilizing this process, a 15-in. full-color TFT-LCD consisting of 1152×900 pixels has been successfully Placed into production.
