ITE Technical Report
Online ISSN : 2424-1970
Print ISSN : 1342-6893
ISSN-L : 1342-6893
24.6
Session ID : IDY2000-8
Conference information
Stability of High Frequency Drived Oxide Phosphor TFEL Devices using a Thick Ceramic Insulator
Toshikuni NAKATANIShingo SUZUKIToshihiro MIYATATadatsugu MINAMI
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Abstract
The stability of various oxide phosphors used as the emitting layer in high-frequency driven TFEL devices is reported. Thick ceramic-insulating-layer-type TFEL devices with a Zn_2Si_xGe_<1-X>O_4:Mn or Ga_2O_3:Mn thin-film emitting layer were life-tested under 10 kHz sinusoidal wave voltage driving. An unsealed Ga_2O_3:Mn TFEL device exhibited long term stable operation of more than 10000 hours at room temperature in the atmosphere.
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© 2000 The Institute of Image Information and Television Engineers
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