ITE Technical Report
Online ISSN : 2424-1970
Print ISSN : 1342-6893
ISSN-L : 1342-6893
33.41
Session ID : MMS2009-61
Conference information
Low cost technology of phase change memory with low-contact-resistivity poly-Si selection diode
Yoshitaka SASAGOMasaharu KINOSHITATakahiro MORIKAWAKenzo KUROTSUCHISatoru HANZAWAToshiyuki MINEAkio SHIMAYoshihisa FUJISAKIHiroshi MORIYANorikatsu TAKAURAKazuyoshi TORII
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Abstract
We have fabricated the cross-point phase change memory with a selection diode made of poly-Si. The selection diode was fabricated using a low-thermal-budget process that achieved low contact resistivity, high on-current density of 8MA/cm^2 and low off-current density of 100A/cm^2. The improvement in the properties of poly-Si diode makes the set/reset operation of the cross-point 4F^2 cell possible, leading to the size reduction of phase change memory chip.
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© 2009 The Institute of Image Information and Television Engineers
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