Fine magnetic dot arrays with an areal density around 1Tbit/in^2 were fabricated for obtaining fabrication process issues and design parameter of bit patterned media (BPM). In dot size analysis, a size distribution of about 1nm of standard deviation existed. This distribution corresponds to about 5kOe in H_k distribution in BPM from a simulated result. In dot period analysis, a dispersion value of about 5% was found in both a scanning direction of EB exposure and a direction perpendicular to the scanning direction. Dot period dispersion must be reduced because it is proportional to switching field distribution (SFD) from a simulated result. Undulation analysis along an EB scanning direction in fine magnetic dots revealed that magnetostatic interaction can be occurred between dots in cross track direction. A very stable and accurate process is required for BPM fabrication at 1Tbit/in^2 and beyond.
