Growth of Magnesium Oxide (MgO) Thin Film with Mist Deposition : Challenge to low temperature growth under the atmospheric pressure

Abstract

Magnesium oxide (MgO) thin film is useful as the protective film for plasma display and the antireflective film. Therefore, the development of method which can prepare the high quality MgO thin film with low utility cost and environment-friendly is very important. Currently, almost all of the fabrication methods of MgO thin film are the techniques operated with vacuum state. The reason is that the direct growth to the glass substrate is very difficult because the high temperature above 500℃ which is not suitable for glass substrate due to the near glass transition temperatures is necessary to prepare the MgO thin film under the atmospheric pressure. Then, we tried making MgO thin film on the glass substrate with mist deposition. Material oxide thin films such as zinc oxide, gallium oxide, tin oxide, indium oxide, ferric oxide, and so on, can be prepared at atmospheric pressure with mist deposition. In this conference, we report on the conditions and the preparations of MgO thin films.