ITE Technical Report
Online ISSN : 2424-1970
Print ISSN : 1342-6893
ISSN-L : 1342-6893
35.4
Session ID : IDY2011-6
Conference information
Improvement in Chemical Stability of a High-γ Protective Layer of PDP during Air Annealing Process
Yasushi MOTOYAMADaisuke KATOMasahiko SEKI
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CONFERENCE PROCEEDINGS FREE ACCESS

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Abstract
We were able to fabricate a PDP with an air-stable high-γ material Ca_<0.36>Mg_<0.64>O protective layer. The thickness of the CaCO_3 layer formed on the surface of the CaMgO protective layer during high-temperature process in air was reduced by a new deposition conditions and increasing the concentration of MgO in the CaMgO protective layer. The discharge voltage of the panel stabilizes at low values (V_f=161V, V_<s min>=112V) within 40h of aging; this duration is remarkably short for a high-γ protective layer under the air annealing process.
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© 2011 The Institute of Image Information and Television Engineers
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