Femtosecond Pulsed Laser Deposition of Graphite on Silicon and Copper Foil

抄録

We deposited graphite on silicon (111) and copper foil substrate through femtosecond pulsed laser deposition (fs-PLD). A high purity graphite target was placed inside a vacuum chamber at a base pressure of 10^-2 mbar. The deposition time was varied for 3 hours, 4 hours and 5 hours. XRD spectra showed a (110) peak indicating an oriented growth for samples deposited on silicon (111) and copper foil substrates. AFM topographical images of the samples deposited on silicon (111) showed flake-like structures. However, samples deposited on copper foil showed the presence of defects and lack of deposited particles.