抄録
The effect of silicon-carbide fine particle bombardment (FPB) was examined as an easy way to improve the adhesion of diamond-like carbon (DLC) films to a substrate. DLC films were deposited on FPB-treated substrates by plasma-based ion implantation and deposition (PBIID) using CH4 and C2H2 as reactant gases. The adhesion force between the film and substrate was evaluated using the critical load as determined by scratch testing. The FPB treatment improved the adhesion about five times and clearly reduced the wear area of the films. Investigation of the reasons for its effectiveness showed that increased surface roughness accounted for about 67% of the improvement, that increased residual stress of the substrate accounted for about 23%, and that an increased ratio of embedded silicon accounted for about 10%.
