Super Cleaning of Closed Space by UV/photoelectron Method Using Photocatalyst

Abstract

A new super cleaning equipment of a closed space using a photocatalyst (TiO₂) in a UV/photoelectron method was developed. The newly developed equipment has photocatalyst between photoelectron emitter and electrode (charging space) in the UV/photoelectron equipment to remove gaseous contaminants, such as hydrocarbons. The equipment developed in this work is characterized as follows : 1) It can create a super clean space in which both gaseous contaminants, such as hydrocarbons, ammonia and particles are removed simultaneously, 2) When Si wafer or metallic substrates are set in the clean space inside such an equipment, surface contamination of the substrates is prevented, 3) In evaluation of actual electron device using MOS (Metal-Oxide-Semiconductor) capacitor, the reliability of gate oxides is improved in the time dependent dielectric breakdown (TDDB) characteristics.